株式会社雄島試作研究所
Tokyo, Japan
Active| Registration number | T2012401010954 |
|---|---|
| Type | Corporation |
| Registered name | 株式会社雄島試作研究所 |
| Address | 東京都武蔵野市西久保３丁目１０番２８号 3-10-28 Nishikubo, Musashino-shi, Tokyo 180-0013, JAPAN |
| Corporate number | 2012401010954 |
| Corporate number assigned on | 2015-10-05 |
| Invoice registered on | 2023-10-01 |
Invoice registration date = when the T-number took effect, not the founding date.
Corporate registry record
| Entity type | Kabushiki Kaisha (stock company) |
|---|---|
| Representative | 代表取締役 野田 一房 |
| Reading (furigana) | オシマシサクケンキュウジョ |
| Reading (romaji) | Oshimashisakukenkyujo |
| English name (unofficial) | Oshimashisaku Kenkyujo K.K. |
| Postal code | 180-0013 |
Source: NTA Corporate Number Publication Site, refreshed daily. Representative: gBizINFO (METI, monthly).
Company profile (gBizINFO)
| Incorporated | 1951-08-10 |
|---|
Source: gBizINFO (METI), refreshed monthly — edited extract by LoreaTec. Figures are as filed by each company.
Government contract awards (GEPS)
1 national government awards on record between 2024-10-24 and 2024-10-24.
| 2024-10-24 | ＨＰＭ用Ｌ帯半導体モジュールの製造 |
|---|
Full award history on Japan Tenders →
出典：調達ポータル（https://www.p-portal.go.jp/）
Payments from national budget programmes (行政事業レビュー)
Ministry review sheets report this company as a payee of 1 programme (1 lines, sheet years 2025–2025; total ¥19.9M).
| 2025 FY2024 | 高出力マイクロ波（ＨＰＭ）照射装置の取得等 ¥19.9M （防衛省） 高出力マイクロ波照射効果の計測評価の研究、試験に必要な役務、備品類等の購入 |
|---|
Contract details (excerpt): ＨＰＭ用Ｌ帯半導体モジュールの製造 ¥19.9M・一般競争契約（最低価格） · bidders 1
Source: 行政事業レビュー見える化サイト (Cabinet Secretariat, PDL 1.0) — edited extract by LoreaTec. A sheet year describes the previous fiscal year’s spending. Programme database →
Verify in official sources
How to cite this page
Data via LoreaTec BizSearch (https://bizsearch.loreatec.jp/t2012401010954) — Source: National Tax Agency corporate-number and qualified-invoice registries. Retrieved 2026-09-25.
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